Experimental Scanning Laser Lithography with Exposure Optimization

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Optimization of the Scanning Angle for Countrywide Laser Scanning

Countrywide collection of laser scanning, mainly due to DTM derivation, is becoming increasingly attractive. Since Finland is a large country, optimization of scanning parameters is important from the economical point of view. High altitude measurements with large scan angle would be cost-effective if accuracy requirements are fulfilled. In this study two cases are described. In Masala low alti...

متن کامل

Advanced oxidation scanning probe lithography.

Force microscopy enables a variety of approaches to manipulate and/or modify surfaces. Few of those methods have evolved into advanced probe-based lithographies. Oxidation scanning probe lithography (o-SPL) is the only lithography that enables the direct and resist-less nanoscale patterning of a large variety of materials, from metals to semiconductors; from self-assembled monolayers to biomole...

متن کامل

Scanning probe block copolymer lithography.

Integration of individual nanoparticles into desired spatial arrangements over large areas is a prerequisite for exploiting their unique electrical, optical, and chemical properties. However, positioning single sub-10-nm nanoparticles in a specific location individually on a substrate remains challenging. Herein we have developed a unique approach, termed scanning probe block copolymer lithogra...

متن کامل

Atom lithography with laser-cooled silicon atoms

An all-solid-state 252 nm coherent light source with external cavities for laser cooling silicon atoms using twostage highly efficient frequency conversions has been developed. With the coherent light source, it is possible to manipulate the atomic motion of the silicon atoms, which is necessary for nano-process applications. In this paper, deflection, collimation, and axial velocity selection ...

متن کامل

Nanometer-accurate Grating Fabrication with Scanning Beam Interference Lithography

We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while th...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: IFAC-PapersOnLine

سال: 2017

ISSN: 2405-8963

DOI: 10.1016/j.ifacol.2017.08.1524